Download Adsorption on Silica Surfaces by Eugene Papirer PDF

By Eugene Papirer

Presents crucial fabric at the floor and adsorption homes of silica. Progresses from theoretical concerns to program, with a old review, in-depth attention of varied eventualities of silica adsorption, and effects from fresh study. Addresses the necessity for particular ways for every form of silica adsorption and uniquely devotes attention to silica adsorption from resolution. particular issues contain floor chemistry utilizing IR and NMR spectroscopies, desktop modeling, micro- and macromolecular species of adsorbents, and the position of silica debris in section transformation of water. The editor is retired learn director on the Centre nationwide de los angeles Recherche Scientifique, Institut de Chimie des Surfaces et Interfaces, France.

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Morrow and A. J. McFarlan. J. Non-Cryst. Solids 120:61 (1990). 8. A. Morrow and A. J. McFarlan. Langmuir 7:1695(1991). 9. A. Burneau, Barres, J. P. Gallas, and J. C. Lavalley. Langmuir 1364 (1990). 10. P. Gallas, J. C. Lavalley, A. Burneau, and Barres. Langmuir 7:1235(1991). 11. A. Burneau, B. Humbert, 0. Barres, J. P. Gallas, and J. C. Lavalley, in The Colloid Chemistry Silica (H. inChem. Series, 234, 1994, pp. 199-222. B. A. Morrow and A. J. McFarlan. Phys. Chem. 96:1395 (1992). 13. D. T. Molapo, Ph.

Hartman, M. F. Richardson, and B. L. Williams. J. Chem. Soc. Chem. Comm. 159 (1985). 40. A. Pines, M. G. Gibby, and J. S. Waugh. J. Chem. Phys. 59:569 (1973). Stejskal, J. Schaefer, and J. S. Waugh. J. Magn. Reson. 28:105 (1977). 41. E. Heidiger, B. H. Meier, and R. R. Ernst. Chem. Phys. Lett. 213:627 (1993). 42. 43. D. E. O’Reilly, H. P. Leftin, and W. K. Hall. J. Chem. Phys. 29:970 (1958). 44. See. Ref. 29, pp. 125-128. 45 D. Freude, D. Muller, and H. Schmiedel. Surf. Sci. 25:289 (1971). 46. B.

The least important propertyof silica as a desiccant relies completely upon silica hydroxylation. The surface of hydrous silica can be visualized an extending domain of Si0- Si bonds and the relativelyhigh polarizability of the large oxygen ion compared with the small silicon ion makes it imperative that the surface is formed by oxygen ion alone. The implication is that at the uppermost layer of the extending joined tetrahedra, theoxygen atoms reside at a higher level than that accommodating the surfacesilicon atoms.

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